The maximum sorption of arsenic by the modified sample is 7.8 mg / g, which is significantly higher than that for natural palygorskite 0.2 mg/g. It has been shown that arsenic is removed by iron-containing silicate rather quickly and does not depend on the pH value of the aqueous medium in the range 3–8.
Controlling the contamination of silicon materials by iron, especially dissolved interstitial iron (Fei), is a longstanding problem with recent developments and several open issues.
2008-9-11 Characterization of iron-contaminations on silicon wafer surface F. Meirer1, G. Pepponi2, C.Streli1, P. Wobrauschek1, C. Horntrich1, Mary Ann Zaitz3 and G. Falkenberg4 1 Atominstitut, TU-Wien, A-1020 Vienna, Austria 2 ITC-irst, via Sommarive 18, 38050 Povo (Trento) Italy 3 IBM Microelectronics, Hopewell Junction, NY, USA
2000-5-1 Experimental techniques to measure trace contamination levels of iron in silicon, such as minority carrier lifetime techniques (SPV, μ-PCD, and ELYMAT), deep-level transient spectroscopy (DLTS), total X-ray fluorescence (TXRF) and vapor-phase decomposition TXRF (VPD-TXRF), atomic absorption spectroscopy (AAS), mass spectrometry and its modifications (SIMS, SNMS, ICP-MS), and neutron activation
1985-6-1 Spiering, B., Seifert, F.A. Iron in silicate glasses of granitic composition: a Mössbauer spectroscopic study. Contr. Mineral. and Petrol. 90, 63–73 (1985). https://doi/10.1007/BF00373042. Download citation. Received: 30 November 1984. Accepted: 08 March 1985. Issue Date: June 1985. DOI: https://doi/10.1007/BF00373042
Iron‐related defects are deleterious in silicon‐based integrated circuits and photovoltaics. In this Letter, data on the contamination of silicon by iron at low temperatures are reported. Substantial...
2005-7-12 Although the densities of other lower-mantle silicates, including ferromagnesian silicate perovskite and CaCl 2-type and α-PbO 2-type SiO 2 (8, 21), cluster around 5.6 gm/cm 3 (±2%), the density of the iron-rich ppv silicate increases by as much as 20% depending on the iron content. Such high density in silicate would have a major impact on the seismic and geodynamic properties of the D″
2016-9-11 metal contamination on silicon wafer surfaces becomes more important. Contamination currently accounts for over 50% of the yield losses in semiconductor IC device manufacturing. Surface contamination concentration techniques such as SME-ICP-MS have been used to determine the purity of both the native and thermal oxide layer on silicon wafers.
SiO2 plays an important role in the production of hot metal (liquid iron) and liquid steel during primary steelmaking. In these slags it is present in the form of silicates and is an important component in determining the basicity (CaO/SiO2) of the slag.
2017-10-31 Prepare all silicate standards using silicate-free water.* This standard should be prepared from the highest purity sodium metasilicate pentahydrate available. To prepare the 1,000 mg/L silicate standard, add 0.353 g of sodium metasilicate pentahydrate to a 100 mL volumetric flask and bring to volume. This standard is stable for at least